10 µm process

Semiconductor manufacturing process

Semiconductor
device
fabrication
MOSFET scaling
(process nodes)
  • 020 µm – 1968
  • 010 µm – 1971
  • 006 µm – 1974
  • 003 µm – 1977
  •  1.5 µm – 1981
  • 001 µm – 1984
  • 800 nm – 1987
  • 600 nm – 1990
  • 350 nm – 1993
  • 250 nm – 1996
  • 180 nm – 1999
  • 130 nm – 2001
  • 090 nm – 2003
  • 065 nm – 2005
  • 045 nm – 2007
  • 032 nm – 2009
  • 028 nm – 2010
  • 022 nm – 2012
  • 014 nm – 2014
  • 010 nm – 2016
  • 007 nm – 2018
  • 005 nm – 2020
  • 003 nm – 2022
Future
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The 10 μm process (10 micron smallest dimension) is the level of MOSFET semiconductor process technology that was commercially reached around 1971,[1][2] by leading semiconductor companies such as RCA and Intel.

Products featuring 10 μm manufacturing process

References

  1. ^ Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Retrieved 11 May 2012.
  2. ^ Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 19 April 2015. Retrieved 19 April 2015.
  3. ^ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. p. 330. ISBN 9783540342588.
  4. ^ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 362–363. ISBN 9783540342588. The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm2, and sold for around $21.
  5. ^ a b "History of the Intel Microprocessor - Listoid". Archived from the original on 27 April 2015. Retrieved 19 April 2015.

External links

  • Brief timeline of microprocessor development
Preceded by
20 μm process
MOSFET semiconductor device fabrication process Succeeded by
6 μm process


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